Analyse par faisceaux d'ions de couches minces à bases de silicium

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dc.contributor.authorChaal, Kahena
dc.date.accessioned2016-02-09T11:34:30Z
dc.date.available2016-02-09T11:34:30Z
dc.date.issued2003
dc.description92 p. : ill. ; 30 cm. (+ CD-Rom)fr_FR
dc.identifier.urihttp://hdl.handle.net/123456789/4488
dc.language.isofrfr_FR
dc.subjectPhysique nucléairefr_FR
dc.subjectCouche mince, analysefr_FR
dc.subjectFaisceau d'ion, Siliciumfr_FR
dc.titleAnalyse par faisceaux d'ions de couches minces à bases de siliciumfr_FR
dc.typeThesisfr_FR

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