Diagnostics of plasma processes based on parallelized spatially resolved in-situ reflection measurements

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dc.contributor.authorSchulz, Christian
dc.contributor.authorRunkel, Jan
dc.contributor.authorOberberg, Moritz
dc.date.accessioned2019-01-07T09:09:53Z
dc.date.available2019-01-07T09:09:53Z
dc.date.issued2016-02
dc.descriptionp.616 - 623en_US
dc.identifier.issn00189480
dc.identifier.urihttp://hdl.handle.net/123456789/6805
dc.language.isoenen_US
dc.relation.ispartofseriesin: IEEE Transactions on Microwave theory and Techniques, Vol.64, n°2 (fév.2016);
dc.subjectTraitement du signalen_US
dc.subjectArgonen_US
dc.subjectCâbles coaxiauxen_US
dc.titleDiagnostics of plasma processes based on parallelized spatially resolved in-situ reflection measurementsen_US
dc.typeArticleen_US

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