Dépôt et caractérisation du silicium en couches minces
dc.contributor.author | Cherfi, Rabah | |
dc.date.accessioned | 2016-12-18T12:14:37Z | |
dc.date.available | 2016-12-18T12:14:37Z | |
dc.date.issued | 2016 | |
dc.description | 151 p. ill. ; 30 cm. (+ CD-Rom) | fr_FR |
dc.identifier.uri | http://hdl.handle.net/123456789/5107 | |
dc.language.iso | fr | fr_FR |
dc.subject | Silicium cristallisé | fr_FR |
dc.subject | Couches minces | fr_FR |
dc.subject | Pulvérisation | fr_FR |
dc.subject | Semiconducteurs amorphes | fr_FR |
dc.title | Dépôt et caractérisation du silicium en couches minces | fr_FR |
dc.type | Thesis | fr_FR |
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