Elaboration et optimisation de l'alliage silicium-germanium (Si-Ge) en couches minces

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dc.contributor.authorZouaoui, Mohamed
dc.date.accessioned2015-12-10T10:19:56Z
dc.date.available2015-12-10T10:19:56Z
dc.date.issued2012
dc.description98 p. : ill. ; 30 cm. (+ CD-Rom)fr_FR
dc.identifier.urihttp://hdl.handle.net/123456789/4245
dc.language.isofrfr_FR
dc.subjectSilicium : Couches mincesfr_FR
dc.subjectPulvérisation cathodiquefr_FR
dc.subjectCourants continus : Champs magnétiquesfr_FR
dc.subjectSemiconducteur amorphesfr_FR
dc.titleElaboration et optimisation de l'alliage silicium-germanium (Si-Ge) en couches mincesfr_FR
dc.typeThesisfr_FR

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