Dopage au bore du silicium amorphe hydrogène déposé par pulvérisation DC magnétron

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dc.contributor.authorKhelifati, Nabil
dc.date.accessioned2015-11-02T13:26:44Z
dc.date.available2015-11-02T13:26:44Z
dc.date.issued2008
dc.description95 p. : ill. ; 30 cm. (+ CD-Rom)fr_FR
dc.identifier.urihttp://hdl.handle.net/123456789/3838
dc.language.isofrfr_FR
dc.subjectSemiconducteurs amorphesfr_FR
dc.subjectPulvérisationfr_FR
dc.subjectMagnétronsfr_FR
dc.subjectHydrogènefr_FR
dc.titleDopage au bore du silicium amorphe hydrogène déposé par pulvérisation DC magnétronfr_FR
dc.typeThesisfr_FR

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